Oxide Etching: Basics ©1988 $450.00 Mechanisms involved in oxide etching are presented. Topics include: ion activated etching, low versus high pressure reactors, polymers for selectivity, and uniformity control. 36 minutes Order Form Semiconductor Services 2269 Chestnut St. #735 San Francisco, CA 94123 Tel:(650) 369-7890 Fax:(415) 346-8099 moreinfo@semiconductorservices.com